NFL Draft: Buffalo Bills reportedly has Top 30 visit scheduled with O’Cyrus Torrence

The interior of the offensive line has been a point of focus for the Buffalo Bills this offseason as they re-signed Ike Boettger as well as free agents Connor McGovern and David Edwards. However, this may not exclude them from drafting another guard in the NFL Draft at the end of April.

One of the top guards in this year’s class is O’Cyrus Torrence out of the University of Florida. The guard position is not one that usually is selected often in the first round but O’Cyrus Torrence could be one of the few that is with his talent.

According to Justin Melo with The Draft Network, the Bills have a Top 30 visit scheduled with Torrence before the NFL Draft. This will be on top of the formal interview the team had with O’Cyrus Torrence at the NFL Combine which Josh Reed with WIVB tweeted.

O’Cyrus Torrence is the not typical offensive lineman the Buffalo Bills have added

On the surface, the interest from the Buffalo Bills makes sense as the interior of the offensive line was an issue for the offense last season. The potential to add arguably the best player at the position would make sense for this team, especially considering he is an excellent run blocker and would vastly improve that part of the line for the Bills.

However, over the years with general manager Brandon Beane, the Bills have identified specific types of offensive linemen and have leaned more toward athletic players. This is not O’Cyrus Torrence’s strong suit as he has a Relative Athletic Score (RAS) of only 6.43.

While he has a great composite size grade (height and weight) he graded okay and poor for composite speed and composite explosion grades respectively. This score is better than almost 65% of the offensive guards since 1987, the Bills have added players that scored over 9 on a scale of 1-10.

It will be interesting to see how the first round progresses and if he is available whether or not the Buffalo Bills change their philosophy and draft O’Cyrus Torrence.